Chlorosilane Tail Gas Mist Eliminator: Protecting TCS Recovery Circuits in Polysilicon Plants
In Siemens process polysilicon production, the tail gas leaving the chemical vapor deposition (CVD) reactor is not waste — it is a recoverable feedstock stream containing unreacted trichlorosilane (TCS), silicon tetrachloride (SiCl₄), and hydrogen chloride (HCl). Recovering these components and returning them to the process is fundamental to the economics of polysilicon production. The mist…



